BROOKS 4800 Series Elastomer Sealed Thermal Mass Flow Controllers & Meters

Ultra-fast response for time-critical flow processes.

Category: BROOKS

Ultra-fast response for time-critical flow processes.

Models 4850 / 4860

	4850	4860
Product Type	Mass Flow Controller	Mass Flow Meter
Flow Range (Full Scale Capacity)	50 sccm-40 slpm	50 sccm-40 slpm
Accuracy	3.0% F.S. 1.0% F.S.(optional)	3.0% F.S. 1.0% F.S.(optional)
Repeatability	0.15% F.S.	0.15% F.S.
Response Time	Normally Closed Valve: 300 ms-<1 sec	Normally Closed Valve: 300 ms-<1 sec
Max Pressure	150 psig/10 barg	150 psig/10 barg
Diagnostic Capability	Status Lights: MFC Health, Network Status Alarms: Sensor Output, Control Walve Output, Over Temperature,Power Surge/Sag, Network Interruption Diagnostic/Service Port: RS485 via 2.5 mm jack	Status Lights: MFC Health, Network Status Alarms: Sensor Output, Control Walve Output, Over Temperature,Power Surge/Sag, Network Interruption Diagnostic/Service Port: RS485 via 2.5 mm jack
Analog Communication	0-5 Vdc 4-20 mA	0-5 Vdc 4-20 mA
Digital Communication	RS232	RS232

Features:

Flow response time (settling time) of less than 0.75 seconds
Innovative MEMS sensor and proprietary PID algorithm
Compact size, less than half the size of typical thermal MFCs: 1″ x 3″ x 4″ (25 mm x 76 mm x 101 mm)
Optional Local Operator Interface (LOI) simplifies set-up and operation, with a free LabVIEW VI download for monitoring and zeroing the device
Digital capability via RS-232

Benefits:

Well suited for a wide range of common, non-corrosive gases
Fast response time ensures rapid steps during process recipe changes
Excellent for OEMs: Compact size facilitates integration into tight machine spaces and speeds up installation
Optional Local Operator Interface (LOI) provides a complete solution for local indication, set point control, and device configuration, eliminating the need for remote secondary electronics
Variety of communication options available for easy alignment with user requirements

Applications:

Heat treating, cutting/welding, and other thermal processes
Solar/thin film physical vapor deposition (PVD) systems
Analytical devices for measuring and controlling reagent, calibration, and sample gas flows