Features:

• Long-term zero stability: <±0.5% full scale per year
• Settling times: 300 ms – <700 ms or 700 ms – <1 second
• Full-scale flow rates up to 300 slpm
• All-metal seal flow path: option for 5µ or 10µ inch Ra surface finish
• Corrosion-resistant Hastelloy® T-Rise sensor improves measurement reproducibility at elevated temperatures
• MultiFloTM gas and range programmability: one device, supports thousands of gas types and range combinations without removing the MFC from the gas line or compromising accuracy
• Local display
• Optional SDS gas delivery
• Optional high-temperature model
• DeviceNetTM, RS-485 L-Protocol, and analog interfaces

Benefits:

• High-performance components tested to seven times semiconductor industry standards for reliability
• All-metal, corrosion-resistant flow path with reduced surface area and unswept volumes for faster dry-down during purge steps
• MultiFloTM allows quick setting of new process gases and ranges in under 60 seconds, eliminating the need to remove and calibrate MFCs
• Highly configurable platform enables drop-in replacement and upgrade of most brands of metal-sealed MFCs, including former Celerity, Mykrolis, Tylan, and UNIT brands
• Convenient user display and independent diagnostic/service port aid device installation, monitoring, and troubleshooting
• GF120 Safe Delivery System (SDS®) ensures low pressure drop for the delivery of sub-atmospheric safe delivery system (SDS) gases used in Implant and Etch processes
• GF120xHT high-temperature mass flow controller can withstand operating environments of up to 150°C

Applications:

• Semiconductor etch tools
• Thin-film chemical vapor deposition systems (CVD, MOCVD, PECVD, ALD)
• Physical vapor deposition (PVD) systems
• Epitaxial process systems
• Advanced strip processes