BROOKS GP200 Series Metal Sealed Pressure-based Mass Flow Controllers

Features:

• True differential pressure measurement
• Lower inlet pressure operation capability
• Downstream valve architecture
• Matched transient response
• Zero Leak-by Control Valve
• MultiFloTM technology allows for flexible programming of gas and flow range configurations without removing the MFC from the gas line or compromising accuracy
• Local display indicates flow, temperature, pressure, and network address
• DeviceNetTM, EtherCAT®, RS-485 L-Protocol, and analog interfaces

Benefits:

• GP200 differential pressure technology reduces measurement uncertainty, enhancing accuracy, repeatability, and drift performance by eliminating the need to match and compensate two separate pressure transducers.
• Safer operation at lower inlet pressures possible with a P-MFC using the optimized GP200 differential pressure sensor for low differential pressure measurement.
• Accuracy remains independent of downstream pressure due to the downstream valve architecture, enabling flow delivery into pressures as high as 1200 Torr. The fast closing valve addresses non-productive recipe wait times and mitigates “tail effects” seen in upstream MFC valve designs that require additional time to bleed down their internal gas volume.
• Ultra-fast and highly repeatable ascending and descending flow stabilization time allows for tighter process control in advanced high-cycle Deposition and Etch processes.
• 100X improvement in valve shut-down capability.
• MultiFloTM enables re-scaling of MFC full-scale flow range down by a factor of 3:1 without impacting accuracy, turndown, or leak-by specifications, providing process and inventory flexibility.
• Convenient user display and independent diagnostic/service port facilitate device installation, monitoring, and troubleshooting.

Key Applications:

• Semiconductor manufacturing
• Etch processes
• Chemical Vapor Deposition (CVD)
• Gas flow control applications that require a high-purity all-metal flow path